Nanosphere lithography

Nanosphere lithography (NSL) is an economical technique for generating single-layer hexagonally close packed or similar patterns of nanoscale features. Generally, NSL applies planar ordered arrays of nanometer-sized latex or silica spheres as lithography masks to fabricate nanoparticle arrays.[1] NSL uses self-assembled monolayers of spheres (typically made of polystyrene) as evaporation masks. This method has been used to fabricate arrays of gold nanodots with precisely controlled spacings.[2]

See also

References

  1. ↑ Cheung, C. L.; Nikolic, R. J.; Reinhardt, C. E.; Wang, T. F. (2006). "Fabrication of nanopillars by nanosphere lithography". Nanotechnology. Lincoln, NE: INSTITUTE OF PHYSICS PUBLISHING, Department of Chemistry and Center for Materials Research and Analysis, University of Nebraska (17): 1339–1343. Bibcode:2006Nanot..17.1339C. doi:10.1088/0957-4484/17/5/028.
  2. ↑ Hatzor-de Picciotto, A.; Wissner-Gross, A. D.; Lavallee, G.; Weiss, P. S. (2007). "Arrays of Cu(2+)-complexed organic clusters grown on gold nano dots" (PDF). Journal of Experimental Nanoscience. 2: 3–11. Bibcode:2007JENan...2....3P. doi:10.1080/17458080600925807.


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